David V. Horak

Edge lithography as a means of extending the limits of optical and nonoptical lithographic resolution

Wu-Song Huang, Steven J. Holmes, Toshiharu Furukawa, 1999, Advanced Lithography.

Characterization of linewidth variation on 248- and 193-nm exposure tools

Lars W. Liebmann, Peter Talvi, Richard A. Ferguson, 2001, SPIE Advanced Lithography.

Cluster Processing For 16-Mb DRAM Production

David V. Horak, Albert Bergendahi, 1990, Other Conferences.

Assessment of negative tone development challenges

Alan C. Thomas, Sohan Singh Mehta, Jerome Wandell, 2012, Other Conferences.

A half-micron CMOS logic generation

Yuan Taur, Edward J. Nowak, Randy W. Mann, 1995, IBM J. Res. Dev..

In-Situ Cluster Processing For Advanced Semiconductor Technologies

David V. Horak, Edward Matuszak, Craig M. Hill, 1990, Other Conferences.