Monica Barrett

Evaluation of the flatness effects of mask backing and orientation during photomask pellicle mount

Kenneth C. Racette, Robert Nolan, Takashi Mizoguchi, 2009, Photomask Japan.

Influence of the pellicle on final photomask flatness

Richard Wistrom, Kenneth C. Racette, Andrew J. Watts, 2006, Photomask Japan.

The relationship between mounting pressure and time on final photomask flatness

Robert Nolan, Takashi Mizoguchi, Satoshi Akutagawa, 2010, Photomask Japan.

EUV masks under exposure: practical considerations

Emily Gallagher, Louis Kindt, Obert Wood, 2011, Advanced Lithography.