W. Dietl

Advantages of the hot-shielding technology with regard to ultra thin RTO quality

I. Eisele, J. Schulze, Z. Nenyei, 2001, 9th International Conference on Advanced Thermal Processing of Semiconductors, RTP 2001.

Optimization of Thin, Nitrogen-Rich Silicon Oxynitrides Grown by Rapid Thermal Nitridation

H. Y. Chung, I. Eisele, J. Schulze, 2005 .

NH3-RTP grown ultra-thin oxynitride layers for MOS gate applications

I. Eisele, A. Ludsteck, H. Chung, 2005 .

Growth model for thin oxides and oxide optimization

I. Eisele, J. Schulze, A. Ludsteck, 2004 .

Pattern Effects with the Mask off...

P. Pichler, P. Timans, W. Lerch, 2006, 2006 14th IEEE International Conference on Advanced Thermal Processing of Semiconductors.