Fuminori Hayano

New measurement technology for CD and pattern profile variation using optical Fourier space

Fuminori Hayano, Akitoshi Kawai, Toshio Uchikawa, 2010, Advanced Lithography.

Method for wafer edge profile extraction using optical images obtained in edge defect inspection process

Hiroaki Okamoto, Fuminori Hayano, Naoshi Sakaguchi, 2010, Advanced Lithography.

New inspection technology for hole pattern by Fourier space on hp 4x-nm generation

Yuichiro Yamazaki, Fuminori Hayano, Akitoshi Kawai, 2009, Advanced Lithography.