Kazumasa Endo

New measurement technology for CD and pattern profile variation using optical Fourier space

Fuminori Hayano, Akitoshi Kawai, Toshio Uchikawa, 2010, Advanced Lithography.

Conversion of radius of curvature to power (and vice versa)

Ulrike Fuchs, Sven Kiontke, Richard N. Youngworth, 2015, SPIE Optical Systems Design.

Hole inspection technology using Fourier imaging method

Akitoshi Kawai, Kazumasa Endo, Kiminori Yoshino, 2009, Advanced Lithography.

New inspection technology for hole pattern by Fourier space on hp 4x-nm generation

Yuichiro Yamazaki, Fuminori Hayano, Akitoshi Kawai, 2009, Advanced Lithography.

Novel technology of automatic macro inspection for 32-nm node and best focus detection

Yuichiro Yamazaki, Kazumasa Endo, Kiminori Yoshino, 2007, SPIE Advanced Lithography.