J. Sporre

发表

Development of an in-situ Sn cleaning method for extreme ultraviolet light lithography

David W. Myers, Oleh V. Khodykin, David N Ruzic, 2011, Advanced Lithography.

Direct measurement and modeling of the redirected ion flux in a high-powered pulsed-plasma magnetron

D. Ruzic, He Yu, L. Meng, 2015 .

Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources

David N Ruzic, John R. Sporre, Dan Elg, 2012, Advanced Lithography.

In situ collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources

Shailendra N. Srivastava, John R. Sporre, Daniel T. Elg, 2016 .

Guiding gate-etch process development using 3D surface reaction modeling for 7nm and beyond

Derren Dunn, Peter L. G. Ventzek, John R. Sporre, 2017, Advanced Lithography.

FINFET technology featuring high mobility SiGe channel for 10nm and beyond

D. Liu, P. Oldiges, N. Loubet, 2016, 2016 IEEE Symposium on VLSI Technology.

Reflectivity degradation of grazing-incident EUV mirrors by EUV exposure and carbon contamination

R. Raju, David N. Ruzic, D. Ruzic, 2009 .

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

P. Oldiges, C. Park, N. Loubet, 2016, 2016 IEEE International Electron Devices Meeting (IEDM).

A 7nm CMOS technology platform for mobile and high performance compute application

J. Zeng, S. Samavedam, B. Senapati, 2017, 2017 IEEE International Electron Devices Meeting (IEDM).

Modeling and measuring the transport and scattering of energetic debris in an extreme ultraviolet plasma source

David N Ruzic, John R. Sporre, Daniel T. Elg, 2016 .

SiGe FinFET for practical logic libraries by mitigating local layout effect

Andreas Knorr, Jie Yang, John R. Sporre, 2017, 2017 Symposium on VLSI Technology.

Magnetic debris mitigation system for extreme ultraviolet sources

Davide Curreli, David N Ruzic, John R. Sporre, 2015 .