Akihiro Otaka

New spatial frequency doubling method for sub-0.15-um optical lithography

Akinobu Tanaka, Akihiro Otaka, Yoshio Kawai, 1995, Advanced Lithography.

Sub-Quarter Micron Logic-Gate-Pattern Fabrication Using Halftone Phase-Shifting Masks

Akihiro Otaka, Yoshio Kawai, 1997 .

Hole Pattern Fabrication using Halftone Phase-Shifting Masks in KrF Lithography

Akihiro Otaka, Yoshio Kawai, Tadahito Matsuda, 1993 .

The effect of an organic base in chemically amplified resist on patterning characteristics using KrF lithography

Akinobu Tanaka, Akihiro Otaka, Yoshio Kawai, 1994 .