Tadahito Matsuda

发表

New spatial frequency doubling method for sub-0.15-um optical lithography

Akinobu Tanaka, Akihiro Otaka, Yoshio Kawai, 1995, Advanced Lithography.

The Front of VLSI Process Technology. Lithography-Its Challenge to Microfabrication.

Tadahito Matsuda, 1997 .

Characteristics of a chemically amplified silicone-based negative resist in KrF excimer laser lithography

Akinobu Tanaka, Jiro Nakamura, Yoshio Kawai, 1992, Advanced Lithography.

Printability of organic defects on an x-ray mask

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1994, Photomask and Next Generation Lithography Mask Technology.

Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Hiroshi Watanabe, Hajime Aoyama, Kenichi Saito, 2000, Advanced Lithography.

Improving the measurement accuracy of pattern width and position of x-ray masks

Masatoshi Oda, Tadahito Matsuda, Shingo Uchiyama, 1998, Photomask and Next Generation Lithography Mask Technology.

Improving stress stability of Ta film for x-ray mask absorbers

Masatoshi Oda, Tadahito Matsuda, Shingo Uchiyama, 1997, Photomask and Next Generation Lithography Mask Technology.

Repairing Ta absorber x-ray masks with gas-assisted focused-ion-beam etching

Ikuo Okada, Tadahito Matsuda, Yasunao Saitoh, 1997, Photomask and Next Generation Lithography Mask Technology.

Cleaning process for x-ray masks

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1996, Photomask and Next Generation Lithography Mask Technology.

A new electron beam patterning technology for 0.2μm VLSI

Katsuhiro Harada, Tadahito Matsuda, Tetsuyoshi Ishii, 1985, 1985 Symposium on VLSI Technology. Digest of Technical Papers.

Chemically amplified negative resist optimized for high-resolution x-ray lithography

Masatoshi Oda, Jiro Nakamura, Yoshio Kawai, 1999, Advanced Lithography.

Development of Semiconductor Production Technolgy to Realize Higher Integration : Microfabrication Technology Supporting Next Generation LSIs

Tadahito Matsuda, 1997 .

Approach to fabricating defect-free x-ray masks

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1995, Advanced Lithography.

Repairing x-ray masks with Ta absorbers using focused ion beams

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1995, Photomask and Next Generation Lithography Mask Technology.

Present status and technical issues of x-ray lithography

Jiro Nakamura, Tadahito Matsuda, Kimiyoshi Deguchi, 1998, Photomask and Next Generation Lithography Mask Technology.

Enhanced defect inspection method for x-ray masks

Ikuo Okada, Tadahito Matsuda, Yasunao Saitoh, 1996, Advanced Lithography.

Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1× X-Ray Masks

Hajime Aoyama, Kenichi Saito, Tetsuo Morosawa, 2000 .

Defect‐free x‐ray masks for 0.2‐μm large‐scale integrated circuits

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1996 .

X-Ray Mask Fabrication Using New Membrane Process Techniques

Masatoshi Oda, Tadahito Matsuda, Shigehisa Ohki, 1997 .

Overlay Repeatability in Mix-and-Match Exposure Using the SR Stepper: SS-1

M. Fukuda, Sunao Ishihara, Tadahito Matsuda, 1994 .

Application of x‐ray lithography with a single‐layer resist process to subquartermicron large scale integrated circuit fabrication

Shinsuke Konaka, Hakaru Kyuragi, Tadahito Matsuda, 1992 .

Patterning performance of EB-X3 x-ray mask writer

Hajime Aoyama, Kenichi Saito, Yuji Takeda, 2000 .

Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication.

Hajime Aoyama, Kenichi Saito, Tetsuo Morosawa, 2000 .

Extendibility of synchrotron radiation lithography to the sub‐100 nm region

Hideo Yoshihara, Akira Ozawa, Masatoshi Oda, 1996 .

Hole Pattern Fabrication using Halftone Phase-Shifting Masks in KrF Lithography

Akihiro Otaka, Yoshio Kawai, Tadahito Matsuda, 1993 .

X-Ray Phase-Shifting Mask for 0.1-µm Pattern Replication under a Large Proximity Gap Condition

Tadahito Matsuda, Kimiyoshi Deguchi, K. Deguchi, 1992 .

Fabrication of 0.2 μm large scale integrated circuits using synchrotron radiation x‐ray lithography

Tadahito Matsuda, Y. Kado, Hiroshi Ban, 1995 .

The effect of an organic base in chemically amplified resist on patterning characteristics using KrF lithography

Akinobu Tanaka, Akihiro Otaka, Yoshio Kawai, 1994 .

Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography

Tadahito Matsuda, Tetsuyoshi Ishii, Kimiyoshi Deguchi, 1992 .

Simulation of X-ray mask pattern displacement

Masatoshi Oda, Tadahito Matsuda, Shingo Uchiyama, 1996 .