D. Turcotte

Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating

D. Drouin, J. Beauvais, E. Lavallée, 2004 .

Nickel pulse reversal plating for image reversal of ultrathin electron beam resist

D. Drouin, J. Beauvais, E. Lavallée, 2007 .

Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists

D. Drouin, J. Beauvais, E. Lavallée, 2002 .

Nanopatterning on fragile or 3D surfaces with sterol-based vapor-deposited electron beam resist

Jacques Beauvais, Eric Lavallee, Dominique Drouin, 2004, SPIE Advanced Lithography.

Nano patterning on optical fiber and laser diode facet with dry resist

Eric Lavallee, Dominique Drouin, Vincent Aimez, 2004 .