A. Holopkin

Evaluation of the dry resist Vinyl-T8 and its application to optical microlenses

M. N. Lyakhov, H. Koops, G. Dahm, 1996 .

Investigation of new dry high sensitive resist using 100 kV electron lithography

K. A. Valiev, E. N. Zhikharev, A. Holopkin, 1994 .