O. Louveau
发表
N. Possémé,
T. Chevolleau,
M. Darnon,
2007
.
A. Farcy,
N. Possémé,
T. Chevolleau,
2005
.
N. Possémé,
T. Chevolleau,
C. Licitra,
2008
.
J. Pontcharra,
P. Besson,
D. Bouchu,
2006
.
P. Leduc,
P. Haumesser,
M. Assous,
2004,
Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729).
C. Leroux,
X. Garros,
G. Reimbold,
2005,
IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..
D. Louis,
N. Possémé,
T. Chevolleau,
2005
.
O. Cueto,
J. de Pontcharra,
S. Orain,
2007,
2007 IEEE International Interconnect Technology Conferencee.
N. Kernevez,
M. Zussy,
Zhihong Huang,
2007,
2007 IEEE International Interconnect Technology Conferencee.
P. Brun,
D. Louis,
M. Assous,
2002
.
J. Cluzel,
O. Louveau,
M. Fayolle,
2003
.
O. Louveau,
Christophe Constancias,
J. Villégier,
2007
.
F. Tardif,
M. Veillerot,
A. Danel,
2003
.
P. Besson,
L. Gabette,
R. Segaud,
2009
.
D. Louis,
V. Jousseaume,
A. Danel,
2003,
Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695).
O. Louveau,
N. Rochat,
D. Louis,
2002,
Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519).
Interface states in HfO/sub 2/ stacks with metal gate: nature, passivation, generation [MOS devices]
X. Garros,
G. Reimbold,
C. Leroux,
2005,
2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual..