T. Ohmori

Correlational Study Between SiN Etch Rate and Plasma Impedance in Electron Cyclotron Resonance Plasma Etcher for Advanced Process Control

Takeshi Ohmori, Satoshi Une, Makoto Kashibe, 2015, IEEE Transactions on Semiconductor Manufacturing.

In situ measurement of plasma charging on SiO2 hole bottoms and reduction by negative charge injection during etching

T. Makabe, T. Ohmori, 2008 .

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

H. Lee, M. Kambara, S. Hamaguchi, 2022, Japanese Journal of Applied Physics.

Negative charge injection to a wafer in a pulsed two-frequency capacitively coupled plasma for oxide etching; diagnostics by emission-selected computerized tomography

T. Makabe, T. Ohmori, T. Goto, 2004 .

Negative charge injection to a positively charged SiO2 hole exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma in CF4/Ar

T. Makabe, T. Kitajima, T. Ohmori, 2003 .

Automated measurement method based on deep learning for cross-sectional SEM images of semiconductor devices

T. Ohmori, Yutaka Okuyama, 2022, Japanese Journal of Applied Physics.

Diagnostics for low-energy electrons in a two-frequency capacitively coupled plasma in Ar

T. Makabe, T. Kitajima, T. Ohmori, 2008 .

Time-Resolved Measurement of Charging on Hole Bottoms of SiO2 Wafer Exposed to Plasma Etching in a Pulsed Two-Frequency Capacitively Coupled Plasma

T. Makabe, T. Kitajima, T. Ohmori, 2005 .

Feature Parameter Design Using Cross-sectional SEM for Machine Learning-based Optimization in Plasma Etching

T. Ohmori, T. Dobashi, Hyakka Nakada, 2020, Microscopy and Microanalysis.