Christine E. Murabito

Test chip for electrical linewidth of copper-interconnect features and related parameters

P. Bendix, M. W. Cresswell, N. Arora, 2001, ICMTS 2001. Proceedings of the 2001 International Conference on Microelectronic Test Structures (Cat. No.01CH37153).

CD Reference Materials for Sub-Tenth Micrometer Applications

Richard A. Allen, Marylyn Hoy Bennett, Michael W. Cresswell, 2002 .

Comparison of SEM and HRTEM CD Measurements Extracted From Test Structures Having Feature Linewidths From 40 to 240 nm

Richard A. Allen, Ronald G. Dixson, Amy Hunt, 2008, IEEE Transactions on Instrumentation and Measurement.

CD reference materials for sub-10th μm applications

Richard A. Allen, Michael W. Cresswell, Loren W. Linholm, 2002, SPIE Advanced Lithography.

Process optimization for lattice-selective wet etching of crystalline silicon structures

Ndubuisi G. Orji, Richard A. Allen, Ronald G. Dixson, 2016 .

Electrical linewidth test structures patterned in [100] silicon-on-insulator for use as CD standards

Richard A. Allen, John E. Bonevich, Michael W. Cresswell, 2001 .

A new critical dimension metrology for chrome-on-glass substrates based on s-parameter measurements extracted from coplanar waveguide test structures

Richard A. Allen, Mona E. Zaghloul, Michael W. Cresswell, 2006, SPIE Photomask Technology.

Critical Dimension Reference Features with Sub-Five Nanometer Uncertainty

Richard A. Allen, Ronald G. Dixson, Michael W. Cresswell, 2005 .

Critical Dimension Calibration Standards for ULSI Metrology

Richard A. Allen, Ronald G. Dixson, Michael W. Cresswell, 2003 .

RM 8111: Development of a Prototype Linewidth Standard

Richard A. Allen, Ronald G. Dixson, Michael W. Cresswell, 2006, Journal of research of the National Institute of Standards and Technology.