J. Daams

发表

Stress, strain, and microstructure of sputter‐deposited Mo thin films

Marcel A. J. Somers, Teunis Johannes Vink, J. L. C. Daams, 1991 .

Lattice-constant-adaptable crystallographics: III. Heteroepitaxial phenomena of semiconductors on garnets; an experimental verification

J. Haisma, J. Maes, A. D. Jong, 1990 .

Atomic-environment classification of the hexagonal “intermetallic” structure types

P. Villars, J. Daams, 1997 .

Atomic-environment classification of the cubic “intermetallic” structure types

P. Villars, J. Daams, J. V. Vucht, 1992 .

Atlas of Crystal Structure Types for Intermetallic Phases

P. Villars, J. Daams, J. V. Vucht, 1991 .

Melt‐Spinning of AB5.5‐Type Hydride‐Forming Compounds and the Influence of Annealing on Electrochemical and Crystallographic Properties

Peter H. L. Notten, P. Notten, R. Einerhand, 1992 .

Phase relationships, magnetic and crystallographic properties of NdFeB alloys

D. B. D. Mooij, K. Buschow, H. V. Noort, 1986 .

Non-stoichiometric Hydride-Forming Compounds: An Excellent Combination of Long-term Stability and High Electrocatalytic Activity*

P. Notten, R. Einerhand, J. Daams, 1994 .

In situ X-ray diffraction: a useful tool to investigate hydride formation reactions

P. Notten, A. D. Veirman, J. Daams, 1994 .

On the nature of the electrochemical cycling stability of non-stoichiometric LaNi5-based hydride-forming compounds Part I. crystallography and electrochemistry

P. Notten, R. Einerhand, J. Daams, 1994 .

Transmission electron microscopy study of order-disorder phenomena in non-stoichiometric LaNi5+x and LaNi6-xCux electrode materials

Phl Peter Notten, R. Einerhand, W. Coene, 1992 .

On the nature of the electrochemical cycling stability of non-stoichiometric LaNi5-based hydride-forming compounds Part II. In situ x-ray diffractometry

P. Notten, R. Einerhand, J. Daams, 1994 .

How to achieve long-term electrochemical cycling stability with hydride-forming electrode materials

P. Notten, R. Einerhand, J. Daams, 1995 .

The interaction of hafnium and aluminium thin films on silicon substrates

I. Raaijmakers, J. Daams, 1985 .

Atomic-environment classification of the chemical elements

P. Villars, P. Villars, J. Daams, 1993 .

Aluminum‐silicide reactions. I. Diffusion, compound formation, and microstructure

Y. Tamminga, G. Gurp, A. Oostrom, 1979 .

Formation and thermal stability of amorphous Cu-Zr thin films deposited by coevaporation

J. J. Broek, T. Minemura, J. Daams, 1988 .

Stress, strain, and microstructure in thin tungsten films deposited by dc magnetron sputtering

T. J. Vink, A. Dirks, M. Somers, 1993 .

Soft magnetic properties of microcrystalline CoFeSiB alloys prepared by sputtering

F. Dirne, C. Witmer, J. Daams, 1988 .

On the homogeneity of sputter-deposited ITO films Part II. Etching behaviour

T. J. Vink, P. C. Baarslag, J. E. Meerakker, 1995 .

On the homogeneity of sputter-deposited ITO films Part I. Stress and microstructure

Teunis Johannes Vink, J. E. A. M. van den Meerakker, J. L. C. Daams, 1995 .