Zhengmao Ye

发表

Defect reduction for semiconductor memory applications using jet and flash imprint lithography

S. Sreenivasan, D. Resnick, F. Xu, 2012 .

Joe C. Campbell, Anupam Madhukar, Eui-Tae Kim, 2003, 2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767).

Defect reduction for semiconductor memory applications using jet and flash imprint lithography

Zhengmao Ye, Frank Xu, S. V. Sreenivasan, 2013, Advanced Lithography.

Nanoimprint System for High Volume Semiconductor Manufacturing; Requirement for Resist Materials

Toshiki Ito, D. Labrake, Weijun Liu, 2016 .

Novel infrared detectors based on semiconductor quantum dots

A. Madhukar, Eui-Tae Kim, Zhonghui Chen, 2004, Infrared and Millimeter Waves, Conference Digest of the 2004 Joint 29th International Conference on 2004 and 12th International Conference on Terahertz Electronics, 2004..

High detectivity InAs quantum dot infrared photodetectors

Joe C. Campbell, Anupam Madhukar, Eui-Tae Kim, 2004 .

Voltage-controllable multiwavelength InAs quantum-dot infrared photodetectors for mid- and far-infrared detection

Joe C. Campbell, Anupam Madhukar, Eui-Tae Kim, 2002 .

High volume jet and flash imprint lithography for discrete track patterned media

Zhengmao Ye, Dwayne LaBrake, Rick Ramos, 2010, Advanced Lithography.

Jet and flash imprint lithography for the fabrication of patterned media drives

Zhengmao Ye, Steve Johnson, S. V. Sreenivasan, 2009, Photomask Technology.

InAs/AlxGa1−xAs quantum dot infrared photodetectors with undoped active region

Joe C. Campbell, Anupam Madhukar, Eui-Tae Kim, 2001 .

Normal incidence InAs/AlxGa1−xAs quantum dot infrared photodetectors with undoped active region

Joe C. Campbell, Anupam Madhukar, Eui-Tae Kim, 2001 .