David P. Klaus

Pattern collapse mitigation strategies for EUV lithography

Robert L. Bruce, Michael A. Guillorn, Dario L. Goldfarb, 2012, Advanced Lithography.

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch

Markus Brink, Joy Cheng, Michael A. Guillorn, 2015, Advanced Lithography.

Pattern transfer of directed self-assembly patterns for CMOS device applications

Sebastian Engelmann, Joy Cheng, Michael A. Guillorn, 2013 .

Mixed e-beam/optical lithography process for the fabrication of sub-0.25-um poly gates

P. J. Coane, David P. Klaus, M. G. Rosenfield, 1993, Advanced Lithography.

Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme

Markus Brink, Sebastian Engelmann, Michael A. Guillorn, 2014, 2014 IEEE International Electron Devices Meeting.

High performance 0.1 /spl mu/m CMOS devices with 1.5 V power supply

Yuan Taur, Keith A. Jenkins, P. J. Coane, 1993, Proceedings of IEEE International Electron Devices Meeting.