Nicholas J. Clecak

Airborne chemical contamination of a chemically amplified resist

Scott A. MacDonald, C. Grant Willson, Nicholas J. Clecak, 1991, Other Conferences.

Novolac Based Deep-UV Resists

Scott A. MacDonald, C. Grant Willson, Dennis R. McKean, 1988, Advanced Lithography.

1X deep-UV lithography with chemical amplification for 1-micron DRAM production

Scott A. MacDonald, C. Grant Willson, Nicholas J. Clecak, 1990, Advanced Lithography.