Toshihiro Minamizawa

High-temperature stability of PECVD-derived organosilica membranes deposited on TiO2 and SiO2–ZrO2 intermediate layers using HMDSO/Ar plasma

Masakoto Kanezashi, Hiroki Nagasawa, T. Tsuru, 2014 .

Microporous organosilica membranes for gas separation prepared via PECVD using different O/Si ratio precursors

Hiroki Nagasawa, T. Tsuru, T. Yoshioka, 2015 .