V. Raballand

发表

Thin film deposition by means of atmospheric pressure microplasma jet

A. Yanguas-Gil, J. Benedikt, A. Keudell, 2007 .

Deposition of silicon dioxide films using an atmospheric pressure microplasma jet

J. Benedikt, A. Keudell, S. Hoffmann, 2009 .

High density fluorocarbon plasma etching of methylsilsesquioxane SiOC(H) low-k material and SiC(H) etch stop layer: surface analyses and investigation of etch mechanisms

C. Cardinaud, D. Eon, G. Cartry, 2007 .

Etching of low-k materials in high density fluorocarbon plasma

C. Cardinaud, D. Eon, G. Cartry, 2004 .

A model for Si, SiCH, SiO2, SiOCH, and porous SiOCH etch rate calculation in inductively coupled fluorocarbon plasma with a pulsed bias: Importance of the fluorocarbon layer

C. Cardinaud, G. Cartry, V. Raballand, 2007 .

Porous SiOCH, SiCH and SiO2 Etching in High Density Fluorocarbon Plasma with a Pulsed Bias

C. Cardinaud, G. Cartry, V. Raballand, 2007 .

Deposition of carbon-free silicon dioxide from pure hexamethyldisiloxane using an atmospheric microplasma jet

J. Benedikt, A. Keudell, V. Raballand, 2008 .

Plasma oxidation of polyhedral oligomeric silsesquioxane polymers

C. Cardinaud, E. Gogolides, N. Vourdas, 2006 .

Inactivation of Bacteria and Biomolecules by Low-Pressure Plasma Discharges

A. Yanguas-Gil, F. Rossi, P. Awakowicz, 2010 .

Inactivation of Bacillus atrophaeus and of Aspergillus niger using beams of argon ions, of oxygen molecules and of oxygen atoms

J. Benedikt, A. von Keudell, V. Raballand, 2008 .