K. Aumaille

发表

A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor

G. Turban, C. Vallée, A. Goullet, 2000 .

Structure and properties of silicon oxide films deposited in a dual microwave-rf plasma reactor

A. Goullet, A. Granier, K. Aumaille, 2001 .

Optical emission spectra of TEOS and HMDSO derived plasmas used for thin film deposition

C. Vallée, M. Vervloet, A. Granier, 2003 .

EXPERIMENTAL INVESTIGATION OF THE RESPECTIVE ROLES OF OXYGEN ATOMS AND ELECTRONS IN THE DEPOSITION OF SIO2 IN O2/TEOS HELICON PLASMAS

G. Turban, C. Vallée, A. Goullet, 1999 .

Study of oxygen/tetraethoxysilane plasmas in a helicon reactor using optical emission spectroscopy and mass spectrometry

G. Turban, M. Schmidt, A. Granier, 2000 .

Mass spectrometric investigation of the positive ions formed in low-pressure oxygen/tetraethoxysilane and argon/tetraethoxysilane plasmas

G. Turban, A. Granier, B. Grolleau, 2001 .

Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma

C. Cardinaud, G. Turban, A. Goullet, 1999 .