M. Jenson

Development of electron cyclotron resonance and inductively coupled plasma high density plasma etching for patterning of NiFe and NiFeCo

S. Pearton, J. Childress, A. T. Hurst, 1998 .

High rate dry etching of Ni0.8Fe0.2 and NiFeCo

S. Pearton, J. Childress, A. T. Hurst, 1997 .

Electron cyclotron resonance plasma etching of materials for magneto-resistive random access memory applications

J. Childress, J. Lee, A. T. Hurst, 1997 .

Cl2‐Based Inductively Coupled Plasma Etching of NiFe and Related Materials

S. Pearton, J. Childress, A. T. Hurst, 1998 .