Frank Katzwinkel

Wafer inspection as alternative approach to mask defect qualification

Uwe Seifert, Christian Holfeld, Jan Hendrik Peters, 2007, SPIE Photomask Technology.

Inspectability and printability of lines and spaces halftone masks for the advanced DRAM node

Thomas Witte, Jan Heumann, Frank Katzwinkel, 2006, SPIE Photomask Technology.

193-nm immersion photomask image placement in exposure tools

Silvio Teuber, Frank Katzwinkel, Eric Cotte, 2006, SPIE Advanced Lithography.