Touko Sase

Diffusion-barrier properties of Ta1−xWx alloy films and silicidation-induced Cu penetration in Cu∕Si contacts

M. B. Takeyama, A. Noya, Touko Sase, 2005 .

Preparation of Ta2Al intermetallic compound films and their application as diffusion barriers to Cu penetration

A. Ohta, K. Sasaki, A. Noya, 1996 .

Properties of TaNx films as diffusion barriers in the thermally stable Cu/Si contact systems

Mayumi B. Takeyama, Atsushi Noya, A. Ohta, 1996 .