T. Yamashita

发表

Novel Low Reflective Index Fluoropolymers based Top Anti-reflective Coatings (TARC) for 193-nm Lithography

H. Aoyama, T. Kanemaru, T. Yamashita, 2007 .

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

T. Furukawa, M. Koh, H. Aoyama, 2004, SPIE Advanced Lithography.

High-sensitivity EUV Resists based on Tetrafluoroethylene contained Fluoropolymers

Yoshito Y. Tanaka, T. Itani, M. Morita, 2011 .

Fluorinated-Polymer Based High Sensitivity Extreme Ultraviolet Resists

Yoshito Y. Tanaka, J. Santillan, T. Itani, 2010 .

Lyophobic and Development Properties of Fluorine Lyophobic Resist

I. Yamamoto, T. Kanemura, T. Yamashita, 2009 .

Stereospecific Preparation of Chiral 1,5-Diketone by One-Methylene Incorporated Dimerization Reaction of d-Camphor Enolate and Reduction of the 1,5-Diketone

Akihisa Yamamoto, S. Kiyooka, T. Yamashita, 1989 .

Stereospecific Preparation of Chiral 1,5-Diketone by One-Methylene Incorporated Dimerization Reaction of d-Camphor Enolate and Reduction of the 1,5-Diketone.

Akihisa Yamamoto, S. Kiyooka, T. Yamashita, 1989 .

One-methylene incorporated dimerization reaction of ketone enolates. 1. A new route to 1,5-diketones from ketones having α-active hydrogen on one side

S. Kiyooka, T. Yamashita, Y. Uchio, 1986 .

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

Hirokazu Aoyama, Takuji Ishikawa, Tetsuhiro Kodani, 2004, SPIE Advanced Lithography.

Surface Chemistry of Fluorine Lyophobic Resist

I. Yamamoto, T. Yamashita, M. Morita, 2011 .

Novel fluorinated compounds that improve durability of antistick layer for quartz mold

Shinji Matsui, Makoto Okada, Tsuneo Yamashita, 2014, Advanced Lithography.

Synthesis of Novel α-Fluoroacrylates and Related Polymers for Immersion Lithography

Yoshito Y. Tanaka, H. Aoyama, Takashi Kanamura, 2008 .

Synthesis of novel &agr;-fluoroacrylates and related polymers for immersion lithography

Takuji Ishikawa, Tsuneo Yamashita, Hirokazu Aoyama, 2008, SPIE Advanced Lithography.

Novel low-reflective index fluoropolymers-based top anti-reflective coatings (TARC) for 193-nm lithography

Hirokazu Aoyama, Takashi Hayami, Takuji Ishikawa, 2007, SPIE Advanced Lithography.

Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

Hirokazu Aoyama, Toshiro Itani, Takuji Ishikawa, 2005, SPIE Advanced Lithography.

Novel main-chain-fluorinated polymers for 157-nm photoresists

Hirokazu Aoyama, Takuji Ishikawa, Meiten Koh, 2003, SPIE Advanced Lithography.

Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Hirokazu Aoyama, Takuji Ishikawa, Meiten Koh, 2003, SPIE Advanced Lithography.

Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Hirokazu Aoyama, Takuji Ishikawa, Meiten Koh, 2003, SPIE Advanced Lithography.

19F NMR of 2‐deoxy‐2‐fluoro‐D‐glucose for tumor diagnosis in mice. An NDP‐bound hexose analog as a new NMR target for imaging

Y. Kanazawa, T. Yamashita, Toshiyuki Shimmura, 1997, NMR in biomedicine.