Andrew R. Neureuther

Polarization masks: concept and initial assessment

Michael Lam, Andrew R. Neureuther, 2002, SPIE Advanced Lithography.

Effect Of Developer Type And Agitation On Dissolution Of Positive Photoresist

Andrew R. Neureuther, William R. Bell, Cynthia Zee, 1988, Advanced Lithography.

Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects

Michael S. Yeung, Andrew R. Neureuther, Robert S. Lee, 1993, Advanced Lithography.

Determination Of Quantitative Resist Models From Experiment

Nelson Tam, Andrew R. Neureuther, William R. Bell, 1988, Advanced Lithography.

Polarization contact: mask engineering

Andrew R. Neureuther, Michael Lam, 2002, Photomask Technology.

Gradient phase-shifter transitions fabricated by ion milling

David M. Newmark, E. W. Scheckler, Andrew R. Neureuther, 1992, Advanced Lithography.