Jason Lee

Focus drilling for increased process latitude in high-NA immersion lithography

Nakgeuon Seong, Tom van der Hoeff, Michiel Kupers, 2011, Advanced Lithography.

65nm node gate pattern using attenuated phase shift mask with off-axis illumination and sub-resolution assist features

Changan Wang, Mark Mason, Robert A. Soper, 2005, SPIE Advanced Lithography.

Self-imaging and high-beam-quality operation in multi-mode planar waveguide optical amplifiers.

H. Baker, D. Hall, Jason Lee, 2002, Optics express.