Andy Neureuther

Analysis of edge effects in attenuating phase-shift masks using quantitative phase imaging

Laura Waller, Aamod Shanker, Martin Sczyrba, 2013, Photomask Technology.

Absorber topography dependence of phase edge effects

Laura Waller, Aamod Shanker, Martin Sczyrba, 2015, SPIE Photomask Technology.

Critical assessment of the transport of intensity equation as a phase recovery technique in optical lithography

Laura Waller, Aamod Shanker, Martin Sczyrba, 2014, Advanced Lithography.

Characterizing the dependence of thick-mask edge effects on illumination angle using AIMS images

Laura Waller, Aamod Shanker, Martin Sczyrba, 2015, Advanced Lithography.

Experimental verification of EUV mask limitations at high numerical apertures

Andy Neureuther, Patrick Naulleau, Hwan-Seok Seo, 2013, Advanced Lithography.

Collaborative platform, tool-kit, and physical models for DfM

Jae-Seok Yang, Andy Neureuther, Paul Friedberg, 2007, SPIE Advanced Lithography.