Farhad Salmassi

发表

Holographic optical elements for the extreme-ultraviolet regime

Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, 2007, SPIE MOEMS-MEMS.

Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2011, Advanced Lithography.

Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab

Farhad Salmassi, Carl Cork, Wenhua Zhu, 2019, Advanced Lithography.

EUVL alternating phase shift mask

Farhad Salmassi, Pei-Yang Yan, Guojing Zhang, 2011, Advanced Lithography.

High-efficiency multilayer blazed gratings for EUV and soft x-rays: recent developments

Valeriy V. Yashchuk, Howard A. Padmore, Mark L. Schattenburg, 2010, Optical Engineering + Applications.

Studies in optimal configuration of the LTP

Samuel K. Barber, Gregory Y. Morrison, Valeriy V. Yashchuk, 2010, Optical Engineering + Applications.

The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Farhad Salmassi, Iacopo Mochi, Erik H. Anderson, 2013, Photomask Technology.

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016 .

Emulation of anamorphic imaging on the SHARP EUV mask microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016, SPIE Advanced Lithography.

Cross-check of different techniques for two-dimensional power spectral density measurements of x-ray optics

Valeriy V. Yashchuk, Farhad Salmassi, Eric M. Gullikson, 2005, SPIE Optics + Photonics.

Variable line spacing diffraction grating fabricated by direct write lithography for synchrotron beamline applications

Howard A. Padmore, Patrick P. Naulleau, Farhad Salmassi, 2014, Optics & Photonics - Optical Engineering + Applications.

Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2002, SPIE Advanced Lithography.

Static EUV micro-exposures using the ETS Set-2 optics

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003, SPIE Advanced Lithography.

Spin-on-glass smoothing of diamond turned optics for use in the extreme ultraviolet regime

Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, 2008, SPIE MOEMS-MEMS.

Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016, Photomask Japan.

Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

Kenneth A. Goldberg, Kevin Bradley, Farhad Salmassi, 2004, SPIE Advanced Lithography.

Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003 .

Design and fabrication of advanced EUV diffractive elements

Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, 2003, SPIE MOEMS-MEMS.

Performance of actinic EUVL mask imaging using a zoneplate microscope

Kenneth A. Goldberg, Farhad Salmassi, Eric M. Gullikson, 2007, SPIE Photomask Technology.

Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Sherry L. Baker, Patrick P. Naulleau, Farhad Salmassi, 2007 .

Optical constants of magnetron-sputtered magnesium films in the 25–1300 eV energy range

Farhad Salmassi, Eric M. Gullikson, Andrew Aquila, 2010 .

Fabrication and performance of nanoscale ultrasmooth programed defects for extreme ultraviolet lithography

Sherry L. Baker, Farhad Salmassi, Paul B. Mirkarimi, 2008 .

Metrologies for the phase characterization of attosecond extreme ultraviolet optics.

Farhad Salmassi, Andrew Aquila, Eric Gullikson, 2008, Optics letters.

Performance optimization of a bendable parabolic cylinder collimating X-ray mirror for the ALS micro-XAS beamline 10.3.2

Gregory Y. Morrison, Valeriy V. Yashchuk, Farhad Salmassi, 2015, Journal of synchrotron radiation.

Spin-on-glass coatings for the generation of superpolished substrates for use in the extreme-ultraviolet region.

Farhad Salmassi, Patrick P Naulleau, Eric M Gullikson, 2006, Applied optics.

Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2010 .

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Kenneth A. Goldberg, Regina Soufli, Patrick P. Naulleau, 2002 .

Advancing the ion beam thin film planarization process for the smoothing of substrate particles

Sherry L. Baker, Farhad Salmassi, Paul B. Mirkarimi, 2005 .

High numerical aperture reflection mode coherent diffraction microscopy using off-axis apertured illumination.

Farhad Salmassi, Eric Gullikson, Bosheng Zhang, 2012, Optics express.

Control of surface mobility for conformal deposition of Mo–Si multilayers on saw-tooth substrates

Valeriy V. Yashchuk, Howard A. Padmore, Farhad Salmassi, 2013 .

Extreme ultraviolet binary phase gratings: Fabrication and application to diffractive optics

Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, 2006 .

Full field tabletop EUV coherent diffractive imaging in a transmission geometry.

Farhad Salmassi, Weilun Chao, Bosheng Zhang, 2013, Optics express.

Demonstration of 20 nm half-pitch spatial resolution with soft x-ray microscopy

Farhad Salmassi, David T. Attwood, Bruce Harteneck, 2003 .

Growth and Printability of Multilayer Phase Defects on EUV MaskBlanks

Sherry L. Baker, Farhad Salmassi, Eric M. Gullikson, 2007 .

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2015 .

Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003 .

Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates

Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, 2004 .

Electromigration in integrated circuit interconnects studied by X-ray microscopy

Farhad Salmassi, Erik H. Anderson, Gregory Denbeaux, 2003 .

Extreme ultraviolet–embedded phase-shift mask

Farhad Salmassi, Eric M. Gullikson, Pei-Yang Yan, 2011 .

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2004 .