S. Jin

发表

Low temperature, high conductivity Al-doped ZnO film fabrication using modified facing target sputtering

Long Wen, J. Han, K. Leksakul, 2015 .

Effect of inductively coupled plasma and plasma parameters on magnetron sputtered Al-Doped ZnO highly conductive thin films at low-temperature

J. Han, B. Sahu, Jay-Bum Kim, 2018 .

Study of Plasma Properties for the Low-Temperature Deposition of Highly Conductive Aluminum Doped ZnO Film Using ICP Assisted DC Magnetron Sputtering

M. Hori, Manish Kumar, J. Han, 2016 .

Low temperature plasma processing for cell growth inspired carbon thin films fabrication.

M. Hori, Manish Kumar, J. Han, 2016, Archives of biochemistry and biophysics.

SiCxHy-based hydrophobic thin films with good chemical and mechanical properties synthesized by PECVD at various substrate temperatures

M. Hori, J. Han, J. Lee, 2015 .

Development and characterization of a multi-electrode cold atmospheric pressure DBD plasma jet aiming plasma application

J. Han, B. Sahu, S. Jin, 2017 .

Wettability Effect of PECVD-SiOx Films on Poly(lactic acid) Induced by Oxygen Plasma on Protein Adsorption and Cell Attachment

L. D. Yu, S. Sarapirom, J. G. Han, 2013 .

Super-hydrophobic coatings with nano-size roughness prepared with simple PECVD method

J. Han, Joon‐Sung Lee, Y. Choi, 2013 .

Characterization of silicon oxide gas barrier films with controlling to the ion current density (ion flux) by plasma enhanced chemical vapor deposition

Youn J. Kim, I. Choi, Y. Choi, 2010 .

Adhesion Properties and Structure of Ion-Beam Modified Polyimide Films

Youn J. Kim, J. Han, S. I. Kim, 2011 .

Surface energy modification of SiOxCyHz film using PECVD by controlling the plasma processes for OMCTS (Si4O4C8H24) precursor

I. Choi, Y. Choi, S. Jin, 2011 .

Improving the gas barrier and mechanical properties of a-SiOx films synthesized at low temperature by using high energy and hydrogen flow rate control

J. Han, B. Sahu, Wen Long, 2015 .

Gas barrier properties of SiON films deposited by plasma enhanced chemical vapor deposition at low temperature as a function of the plasma process parameters

J. Han, Joon‐Sung Lee, Yoon S. Choi, 2013 .

Improving the gas barrier properties of a-SiOxCyNz film at low temperature using high energy and suitable nitrogen flow rate

M. Hori, Joon‐Sung Lee, I. Choi, 2013 .

Effectiveness of plasma diagnostic in ultra high frequency and radio frequency hybrid plasmas for synthesis of silicon nitride film at low temperature

M. Hori, K. Shin, J. Han, 2014 .

Surface energy and wettability control in bio-inspired PEG like thin films

Manish Kumar, J. Han, Long Wen, 2016 .

Effect of bipolar pulsed dc bias on the mechanical properties of silicon oxide thin film by plasma enhanced chemical vapor deposition

J. Han, I. Choi, Y. Choi, 2011 .

Effect of rf bias (ion current density) on the hardness of amorphous silicon oxide films deposited by plasma enhanced chemical vapor deposition

Youn J. Kim, J. Han, Yoon S. Choi, 2010 .

Study on Effects of Hydrogen Flow Rates on the Properties of ZnO Thin Film Deposited by Facing Targets Sputtering System

M. Hori, Yoon-Seok Choi, J. Han, 2013 .

Microstructural control by substrate heating in Pulse-DC sputtering induced thermoelectric Ge2Sb2Te5 thin films

T. Seetawan, Manish Kumar, M. Horprathum, 2018, Journal of Alloys and Compounds.

Advantage of dual-confined plasmas over conventional and facing-target plasmas for improving transparent-conductive properties in Al doped ZnO thin films

Long Wen, Komgrit Leksakul, Manish Kumar, 2015 .

High-rate deposition and mechanical properties of SiOx film at low temperature by plasma enhanced chemical vapor deposition with the dual frequencies ultra high frequency and high frequency

Joon‐Sung Lee, I. Choi, Y. Choi, 2011 .

Study on the electrical properties of ITO films deposited by facing target sputter deposition

Youn J. Kim, Yoon-Seok Choi, J. Han, 2009 .