Y. Ho

Integrated Oxidation/anneal Processes To Treat Out The LDD Side Wall Stress From TEOS Spacer Anisotropic Etch

Hui-Hua Chang, Chi-Fu Ni, Sheng-Jyh Wu, 1997, 2nd International Symposium on Plasma Process-Induced Damage.

Preparation of low leakage current fluorine-doped silicon-oxycarbide by PECVD

Ying-Lang Wang, Jow-Lay Huang, Y. Juang, 2008 .