E. Toyota

Performance of a compact beamline with high brightness for x-ray lithography

T. Miyatake, K. Fujii, Katsumi Suzuki, 2000 .

Construction of the multilayered-mirror monochromator beam line for the study of synchrotron radiation stimulated process

H. Mekaru, S. Masui, H. Takenaka, 1999 .

Extendibility of proximity x-ray lithography to 25 nm and below

M. Washio, E. Toyota, 2002 .