William Chu

发表

Evaluation of the Defense Advanced Lithography Program (DALP) x-ray lithography aligner

Alek C. Chen, Azalia A. Krasnoperova, Alex L. Flamholz, 1997, Advanced Lithography.

Comparison of dry-etch approaches for tungsten patterning

Martin C. Peckerar, K. W. Rhee, Orest J. Glembocki, 1994, Advanced Lithography.

X‐ray induced mask contamination and particulate monitoring in x‐ray steppers

Scott Daniel Hector, Jeffrey A. Leavey, Victor Pol, 1996 .

Reactive ion etching of high‐aspect‐ratio 100 nm linewidth features in tungsten

Martin C. Peckerar, K. W. Rhee, William Chu, 1994 .