Hisashi Nakagawa

发表

Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Geert Vandenberghe, Hans-Jürgen Stock, Yasin Ekinci, 2017, Advanced Lithography.

Novel EUV resist development for sub-14nm half pitch

Ramakrishnan Ayothi, Takehiko Naruoka, Masafumi Hori, 2015, Advanced Lithography.

Novel high sensitivity EUV photoresist for sub-7nm node

Gijsbert Rispens, Marieke Meeuwissen, Rik Hoefnagels, 2016, SPIE Advanced Lithography.

Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography

Gijsbert Rispens, Marieke Meeuwissen, Rik Hoefnagels, 2016, SPIE Advanced Lithography.

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Geert Vandenberghe, Hans-Jürgen Stock, Kazuhiro Takeshita, 2018, Advanced Lithography.

Simulation and experimentation of PSCAR chemistry for complex structures

Akihiro Oshima, Seiji Nagahara, Seiichi Tagawa, 2017, Advanced Lithography.

Novel metal containing resists for EUV lithography extendibility

Geert Vandenberghe, Danilo De Simone, Ivan Pollentier, 2016, SPIE Advanced Lithography.

Start-up performance and pattern defectivity improvement using 2nm rated nylon filter developed with lithography filtration expertise

Toru Umeda, Takehito Mizuno, Tetsuya Murakami, 2019, Advanced Lithography.

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

Gijsbert Rispens, Marieke Meeuwissen, Rik Hoefnagels, 2016 .

Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

Gijsbert Rispens, Marieke Meeuwissen, Rik Hoefnagels, 2016, SPIE Advanced Lithography.

A Parallel Control System for Continuous Architecture Using Finite Element Method

Daigoro Isobe, Hisashi Nakagawa, 1998 .

Novel High Sensitivity EUV Photoresist for Sub-7 nm Node

Gijsbert Rispens, Marieke Meeuwissen, Rik Hoefnagels, 2016 .

Novel EUV Resist development for Sub-14nm Half Pitch

Ramakrishnan Ayothi, Takehiko Naruoka, Masafumi Hori, 2015 .

Recent EUV Resists toward High Volume Manufacturing

Takehiko Naruoka, Hisashi Nakagawa, Tomoki Nagai, 2014 .