Roger A. Nassar

Chemically amplified resists resolving 25 nm 1:1 line: space features with EUV lithography

Yayi Wei, James W. Thackeray, Patrick P. Naulleau, 2007, SPIE Advanced Lithography.

Structure-Activity Relationship for Hydrophobic Salts as Viscosity-Lowering Excipients for Concentrated Solutions of Monoclonal Antibodies

Roger A. Nassar, Bernhard Helk, Alexander M. Klibanov, 2012, Pharmaceutical Research.

Pathway to sub-30nm Resolution in EUV Lithography

Yayi Wei, Warren Montgomery, Dario L. Goldfarb, 2007 .

Evaluation of High and Low Activation Resists for EUV Lithography

James W. Thackeray, Roger A. Nassar, Tom Wallow, 2006 .