Y. Miyagawa

Post-deposition reduction of internal stress in thin films: The case of HfN coatings bombarded with Au ions

R. Nowak, S. Nakao, C. Li, 1997 .

Annealing properties of open volumes in strained SiN films studied by monoenergetic positron beams

A. Uedono, K. Yamabe, K. Asai, 2007 .

Deposition of a-SixC1-x:H alloy films by tetrode RF sputtering

T. Tachibana, Y. Miyagawa, Y. Gekka, 1994 .

Local Bonding Structure of High-Stress Silicon Nitride Film Modified by UV Curing for Strained Silicon Technology beyond 45 nm Node SoC Devices

A. Uedono, K. Asai, M. Yoneda, 2006 .

Process Optimization of UV Curing for Ultra Low-k Dielectrics and High-Stress SiN Liners

K. Asai, T. Murata, Y. Tsunemine, 2007 .

X-ray photoelectron studies on stainless steel (SUS 304) in a heliotron e toroidal plasma confining device

O. Motojima, A. Iiyoshi, S. Besshou, 1986 .

Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High-k/Metal Gate Transistor

Tomohiro Yamashita, Hiroshi Miyatake, Yoshiki Yamamoto, 2009 .