T. Newman

Low voltage, high resolution studies of electron beam resist exposure and proximity effect

M. McCord, T. Newman, 1992 .

High-throughput, high-resolution electron-beam lithography

T. R. Groves, H. C. Pfeiffer, T. H. Newman, 1988 .

100 kV thermal field emission electron beam lithography tool for high‐resolution x‐ray mask patterning

Alan D. Wilson, R. Viswanathan, F. Hohn, 1992 .

Design and characterization of compact 100 nm‐scale silicon metal–oxide–semiconductor field effect transistors

J. Keller, S. Wind, R. Volant, 1992 .

Submicron YBa2Cu3O7-d grain boundary junction dc SQUIDs

M. Kawasaki, P. Chaudhari, A. Gupta, 1991 .

Wear Reducing Technology Newly Applied To Severe Pumping Services

Tom Newman, Terry Wiltz, Dave Hertel, 2011 .

High resolution patterning system with a single bore objective lens

Roger Fabian W. Pease, T. H. Newman, R. Pease, 1987 .

Submicron YBa2Cu3O7-δ grain boundary junction dc SQUIDs

M. Kawasaki, Arunava Gupta, P. Chaudhari, 1991 .

A high-performance 0.08 /spl mu/m CMOS

E. Nowak, A. Ray, P. Agnello, 1996, 1996 Symposium on VLSI Technology. Digest of Technical Papers.