G. Willson

Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device

William J. Dauksher, Kevin J. Nordquist, Todd C. Bailey, 2003, SPIE Advanced Lithography.

Macromolecular Stereochemistry: The Out-of-Proportion Influence of Optically Active Comonomers on the Conformational Characteristics of Polyisocyanates. The Sergeants and Soldiers Experiment

Robert D Johnson, G. D. Darling, D. J. O'Leary, 1989 .

Methylated poly(4‐hydroxystyrene): A new resin for deep‐ultraviolet resist application

W. Hinsberg, D. R. Mckean, G. Willson, 1990 .

Structures, properties and miscibility behaviour of liquid crystalline polycatenar tetrone derivatives

H. Ringsdorf, G. Pelzl, S. Diele, 1995 .

Plasma etch of block copolymers for lithography

Stephen M. Sirard, Michael J. Maher, William J. Durand, 2016 .

Understanding the photoresist surface-liquid interface for ArF immersion lithography

Will Conley, Ralph R. Dammel, Andrew R. Romano, 2005, SPIE Advanced Lithography.

Shot-noise and edge roughness effects in resists patterned at 10 nm exposure

Andrew R. Neureuther, Taro Ogawa, Charles H. Fields, 1998 .