E. Eva

Laser conditioning of LaF(3)/MgF(2) dielectric coatings at 248 nm.

D. Ristau, N. Kaiser, D Ristau, 1996, Applied optics.

Nonlinear absorption of thin Al2O3 films at 193 nm.

O. Apel, K. Mann, E. Eva, 2000, Applied optics.

High damage threshold Al2O3SiO2 dielectric coatings for excimer lasers

Hein Uhlig, Norbert Kaiser, Klaus R. Mann, 1995 .

Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials

E. Eva, K. Mann, K. Mann, 1996 .