C. Bayer

On the Correlation Between Deposition Rate and Process Parameters in Remote Plasma-Enhanced Chemical Vapor Deposition

P. R. von Rohr, C. Bayer, 1998 .

A circulating fluidised bed for plasma-enhanced chemical vapor deposition on powders at low temperatures

P. Rohr, C. Bayer, M. Karches, 1999 .

Plasma CVD of Ultrathin TiO2 Films on Powders in a Circulating Fluidized Bed

P. Rohr, M. Morstein, D. Casanova, 2000 .

Overall kinetics of SiOx remote-PECVD using different organosilicon monomers

P. Rohr, C. Bayer, E. Bapin, 1999 .