A. Vaglio Pret

Mitigating mask roughness via pupil filtering

B. Baylav, C. Maloney, Z. Levinson, 2014, Advanced Lithography.

Impact of stochastic effects on EUV printability limits

A. Vaglio Pret, P. De Bisschop, J. Van de Kerkhove, 2014, Advanced Lithography.

Hydrogen plasma treatment: the evolution of roughness in frequency domain

S. De Gendt, A. Vaglio Pret, Z. el Otell, 2014, Advanced Lithography.

Line edge and width roughness smoothing by plasma treatment

S. De Gendt, W. Boullart, A. Vaglio Pret, 2013, Advanced Lithography.