C. J. Taylor

发表

Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV

Jeffrey T. Roberts, D. Gilmer, S. Campbell, 1998 .

Low temperature chemical vapor deposition of titanium dioxide thin films using tetranitratotitanium (IV)

Jeffrey T. Roberts, D. Gilmer, S. Campbell, 1997 .

Does Chemistry Really Matter in the Chemical Vapor Deposition of Titanium Dioxide? Precursor and Kinetic Effects on the Microstructure of Polycrystalline Films

Jeffrey T. Roberts, D. Gilmer, S. Campbell, 1999 .

Chemical Vapor Deposition of Titania/Silica and Zirconia Films

Jeffrey T. Roberts, S. Campbell, C. Hobbs, 2001 .

Amorphous Mixed TiO 2 and SiO 2 Films on Si(100) by Chemical Vapor Deposition

Jeffrey T. Roberts, S. Campbell, W. Gladfelter, 2000 .

Group IVB Oxides as High Permittivity Gate Insulators

S. Campbell, T. Ma, W. Gladfelter, 1999 .

Observation of precursor control over film stoichiometry during the chemical vapor deposition of amorphous TixSi1-xO2 films

Jeffrey T. Roberts, S. Campbell, C. Hobbs, 2000 .

Low Temperature Chemical Vapor Deposition of ZrO2 on Si(100) Using Anhydrous Zirconium (IV) Nitrate

Jeffrey T. Roberts, S. Campbell, D. Buchanan, 2000 .

Mesoporous Polystyrene Monoliths

Marc A. Hillmyer, M. Hillmyer, A. Zalusky, 2001 .

Microstructure of Al contacts on GaAs

Jeffrey T. Roberts, W. Gladfelter, A. Franciosi, 1997 .

Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates

S. Campbell, D. Buchanan, M. Gribelyuk, 2001 .

High permittivity gate insulators TiO2 and ZrO2

S. Campbell, T. Ma, M. Gribelyuk, 1999 .