Changil Oh

Topcoat-less resist process for 2Xnm node devices

Changil Oh, Junghyung Lee, Junggun Heo, 2010, Advanced Lithography.

Characteristics analysis of RELACS process from an OPC point of view

Changil Oh, Donggyu Yim, Jinyoung Choi, 2012, Other Conferences.

Defect printability analysis in negative tone development lithography

Changil Oh, Junghyung Lee, Junggun Heo, 2011, Advanced Lithography.

Comparison of EUV patterning performance between PTD and NTD for 1Xnm DRAM

Changil Oh, Junghyung Lee, Cheol-Kyu Bok, 2014, Advanced Lithography.

EUV-patterning characterization using a 3D mask simulation and field EUV scanner

Sunyoung Koo, Jun-Taek Park, Chang-Moon Lim, 2009, Advanced Lithography.