Junghyung Lee

Topcoat-less resist process for 2Xnm node devices

Changil Oh, Junghyung Lee, Junggun Heo, 2010, Advanced Lithography.

Defect printability analysis in negative tone development lithography

Changil Oh, Junghyung Lee, Junggun Heo, 2011, Advanced Lithography.

Staggered pillar patterning using 0.33NA EUV lithography

Lieve Van Look, Geert Vandenberghe, Jeroen Van de Kerkhove, 2019, Advanced Lithography.

Comparison of EUV patterning performance between PTD and NTD for 1Xnm DRAM

Changil Oh, Junghyung Lee, Cheol-Kyu Bok, 2014, Advanced Lithography.

Optimization of BARC process for hyper-NA immersion lithography

Junghyung Lee, Kilyoung Lee, Sungkoo Lee, 2008, SPIE Advanced Lithography.

Study on RLS trade-off resist upgrade for production ready EUV lithography

Sunyoung Koo, Chang-Moon Lim, Junghyung Lee, 2016, SPIE Advanced Lithography.

Mesh patterning process for 40nm contact hole

Junghyung Lee, Junggun Heo, Hyunkyung Shim, 2010, Advanced Lithography.

Extension of practical k1 limit in EUV lithography

Sunyoung Koo, Chang-Moon Lim, Junghyung Lee, 2016, SPIE Advanced Lithography.