P. Broman

Tender point sensitivity, range of motion, and perceived disability in subjects with neck pain.

D. P. O'connor, S. Olson, D. O'Connor, 2000, The Journal of orthopaedic and sports physical therapy.

Illumination source optimization in EUV lithography for staggered contact holes and pillars for DRAM applications

Gijsbert Rispens, Chang-Moon Lim, Chang-Nam Ahn, 2018, Advanced Lithography.

EUV source optimization driven by fundamental diffraction considerations

Jo Finders, Paul van Adrichem, Eelco van Setten, 2017, Photomask Technology.

ASML NXE pellicle update

Par Broman, Derk Brouns, Raymond Lafarre, 2019, Photomask Japan.

Extending immersion lithography down to 1x nm production nodes

Igor Bouchoms, Haico Kok, Joost Smits, 2013, Advanced Lithography.