Frank E. Abboud

发表

of 250 nm design rule IC devices

Frank E. Abboud, David W. Alexander, Thomas P. Coleman, 2017 .

Dynamic corrections in MEBES 4500

Frank E. Abboud, Albert Benveniste, Leonard Gasiorek, 1994 .

Advanced electron-beam pattern generation technology for 180-nm masks

Frank E. Abboud, Charles A. Sauer, William Wang, 1997, Photomask Technology.

Pattern generation requirements for mask making beyond 130 nm

Frank E. Abboud, Juan R. Maldonado, Mark A. Gesley, 1998, Advanced Lithography.

Raster scan patterning solution for 100- and 70-nm OPC masks

Ki-Ho Baik, Frank E. Abboud, Mark Mueller, 2002, Photomask Japan.

Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

Frank E. Abboud, Charles A. Sauer, Ulrich Hofmann, 1999, Advanced Lithography.

System architecture choices for an advanced mask writer (100 to 130 nm)

Frank E. Abboud, Sergey Babin, David Trost, 1999, Photomask Technology.

Address data reduction and lithography performance of graybeam writing strategies for raster scan mask generation

Frank E. Abboud, C. N. Berglund, Frederick Raymond, 1994 .

Evaluation of OPC mask printing with a raster scan pattern generator

Frank E. Abboud, Olivier Toublan, Frederick Raymond, 2002, SPIE Advanced Lithography.

Real time monitoring of reticle etch process tool to investigate and predict critical dimension performance

Ki-Ho Baik, Frank E. Abboud, Karmen Yung, 2007, SPIE Advanced Lithography.

Design considerations for an electron-beam pattern generator for the 130-nm generation of masks

Frank E. Abboud, Sergey Babin, Charles A. Sauer, 1999, Photomask and Next Generation Lithography Mask Technology.

Initial benchmarking of a new electron-beam raster pattern generator for 130-100 nm maskmaking

Frank E. Abboud, Sergey Babin, David Trost, 2000, Advanced Lithography.

100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology

Frank E. Abboud, Robert J. Naber, David Trost, 2002, SPIE Photomask Technology.

MEBES 4000 optimization and characterization of MEBES 4500

Frank E. Abboud, Jim DeWitt, Leonard Gasiorek, 1994, Photomask Technology.

High-productivity mask writer with broad operating range

Maiying Lu, Ki-Ho Baik, Frank E. Abboud, 2001, Photomask Japan.

Extension of graybeam writing for the 130-nm technology node

Maiying Lu, Frank E. Abboud, Charles A. Sauer, 1999, Photomask Technology.

Advanced Mask Patterning Technology for the 130-100nm Generation (新しい地球環境と豊かなネットワーク社会を生み出す半導体技術) -- (Session 3: Mask Technology: The Key Technology for the Future of Semiconductor Industry--Mask Technology Leads the Future of ULSI)

Frank E. Abboud, Mark A. Gesley, Urich Hofmann, 1999 .

MEBES reticle writers for 350-nm and 250-nm design rules

Frank E. Abboud, Charles A. Sauer, Robert J. Naber, 1994, Photomask and Next Generation Lithography Mask Technology.

Elements of an advanced pattern generator for 130- to 100-nm maskmaking

Frank E. Abboud, David Trost, Ulrich Hofmann, 2000, Photomask Japan.

Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation

Maiying Lu, Frank E. Abboud, David W. Alexander, 2000, Advanced Lithography.

New MEBES pattern generator

Frank E. Abboud, Suzanne Weaver, Damon M. Cole, 1998, Photomask Technology.

REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology

Maiying Lu, Ki-Ho Baik, Frank E. Abboud, 2002, SPIE Advanced Lithography.

Raster Shaped Beam Pattern Generation for 70 nm Photomask Production

Frank E. Abboud, Allan L. Sagle, Sriram Krishnaswami, 2002, Photomask Technology.

Comparative study between REAP 200 and FEP171 CAR with 50-kV raster e-beam system for sub-100-nm technology

Ki-Ho Baik, Frank E. Abboud, Mark Mueller, 2003, Photomask Japan.

Alignment technique for second-level exposure of phase-shifting masks using 10-kV raster-scan electron-beam lithography system

Frank E. Abboud, Robert J. Naber, Jorge L. Freyer, 1993, Photomask Technology.

Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices

Frank E. Abboud, David W. Alexander, Allen Cook, 1996, Photomask and Next Generation Lithography Mask Technology.

Lithography and CD performance of advanced MEBES mask pattern generators

Maiying Lu, Frank E. Abboud, David W. Alexander, 2000, European Mask and Lithography Conference.

Further advances in electron-beam pattern generation technology for 180-nm masks

Maiying Lu, William Wang, Frank E. Abboud, 1998, Photomask and Next Generation Lithography Mask Technology.

MEBES IV: a new generation raster-scan electron-beam lithography system

Frank E. Abboud, Robert L. Smith, John T. Poreda, 1992, Advanced Lithography.

Special Section Guest Editorial: Photomasks for EUV Lithography

Frank E. Abboud, Christopher J. Progler, 2013 .

Multipass gray printing for the new MEBES 4500S mask lithography system

Frank E. Abboud, Charles A. Sauer, Robert J. Naber, 1997, Photomask and Next Generation Lithography Mask Technology.

Lithographic performance results for a new 50-kV electron-beam mask writer

Frank E. Abboud, David Trost, Charles A. Sauer, 2001, SPIE Photomask Technology.

Multi-beam mask writer in EUV era: challenges and opportunities

Frank E. Abboud, Bassam Shamoun, Mahesh Chandramouli, 2021, Advanced Lithography.

Optimization of field-emission columns for next-generation MEBES® systems

Frank E. Abboud, Henry Thomas Pearce-Percy, Marian Mankos, 1997 .

Electron Beam Column Developments for Submicron- and Nanolithography

Frank E. Abboud, Mark A. Gesley, Sterling M. Watson, 1993 .

Feasibility study of new graybeam writing strategies for raster scan mask generation

Frank E. Abboud, C. N. Berglund, Frederick Raymond, 1993 .

Electrodynamics of fast beam blankers

Frank E. Abboud, Mark A. Gesley, Frederick Raymond, 1993 .