M. Nakamura

Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development

K. Yoshikawa, T. Nozaki, Kazuo Takahashi, 2019, Japanese Journal of Applied Physics.

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation

K. Yoshikawa, T. Nozaki, Kazuo Takahashi, 2019, Japanese Journal of Applied Physics.

Surface reactions during etching of organic low-k films by plasmas of N2 and H2

S. Yamasaki, S. Samukawa, K. Ishikawa, 2006 .

Additive Nitrogen Effects on Oxygen Plasma Downstream Ashing

H. Yano, S. Fujimura, M. Nakamura, 1990 .

Free Radicals in an Inductively Coupled Etching Plasma

Y. Hikosaka, H. Sugai, M. Nakamura, 1994 .

Resist stripping in an O2+H2O plasma downstream

S. Fujimura, Miki T. Suzuki, M. Nakamura, 1991 .