Kazunori Shinoda

Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development

K. Yoshikawa, T. Nozaki, Kazuo Takahashi, 2019, Japanese Journal of Applied Physics.

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma

M. Hori, K. Ishikawa, Nobuya Miyoshi, 2019, Journal of Physics D: Applied Physics.

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation

K. Yoshikawa, T. Nozaki, Kazuo Takahashi, 2019, Japanese Journal of Applied Physics.

Thermal-cyclic atomic layer etching of cobalt with smooth etched surface by plasma oxidation and organometallization

H. Hamamura, M. Izawa, Hiroyuki Kobayashi, 2022, Applied Physics Letters.

Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes?

K. Yoshikawa, T. Nozaki, Kazuo Takahashi, 2019, Japanese Journal of Applied Physics.

Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3

M. Kurihara, Nobuya Miyoshi, M. Izawa, 2022, Journal of Vacuum Science & Technology A.

Isotropic atomic layer etchings of various materials by using dry chemical removal

Y. Yamaguchi, H. Ohtake, Nobuya Miyoshi, 2022, Japanese Journal of Applied Physics.