J. Beulens

发表

Diagnostics of a hydrocarbon plasma jet using the A2D-X2P system of CH

J. Koulidiati, D. Schram, A. Czernichowski, 1998 .

Atomic and molecular emission spectroscopy on an expanding argon/methane plasma

J. Koulidiati, D. Schram, J. Beulens, 1994 .

Effect of capacitive coupling on inductively coupled fluorocarbon plasma processing

Neal R. Rueger, T. Standaert, G. Oehrlein, 1999 .

Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, Marcus F. Doemling, Neal R. Rueger, 1997 .

Plasma deposited carbon films as a possible means for divertor repair

A. Buuron, D. Schram, J. Beulens, 1992 .

Fast deposition of plasma polymer layers

D. Schram, G. Kroesen, J. Beulens, 1990 .

The physics of plasma polymer deposition

D. Schram, G. Kroesen, J. Beulens, 1990 .

Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, Marcus F. Doemling, Neal R. Rueger, 1999 .

Study of plasma - surface interactions: chemical dry etching and high-density plasma etching

Marcus F. Doemling, Neal R. Rueger, T. Standaert, 1996 .

Radiative energy loss in a two-temperature argon plasma

D. Schram, J. Beulens, A. Wilbers, 1991 .

Chemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures

Gottlieb S. Oehrlein, G. Oehrlein, B. Kastenmeier, 1996 .

Fast silicon etching using an expanding cascade arc plasma in a SF6/argon mixture

G. Oehrlein, D. Schram, G. Kroesen, 1992 .

Thermal Discharges: Experiments and Diagnostics

Van de Sanden, D. Schram, van der J.J.A.M. Mullen, 1993 .

Carbon deposition using an expanding cascaded arc d.c. plasma

A. Buuron, D. Schram, J. Beulens, 1991 .

Absorption spectroscopy on an expanding argon arc plasma

Van de Sanden, A. Buuron, D. Otorbaev, 1993 .

A two-dimensional nonequilibrium model of cascaded arc plasma flows

D. Schram, D. Milojevic, J. Beulens, 1991 .

Axial temperatures and electron densities in a flowing cascaded arc

J. Szekely, D. Apelian, D. Schram, 1990 .

Fast deposition of amorphous carbon and silicon layers

M. Sanden, A. Buuron, D. Schram, 1993 .

Role of N2 addition on CF4/O2 remote plasma chemical dry etching of polycrystalline silicon

G. Oehrlein, B. Kastenmeier, P. J. Matsuo, 1997 .

Chemical downstream etching of silicon–nitride and polycrystalline silicon using CF4/O2/N2: Surface chemical effects of O2 and N2 additives

Gottlieb S. Oehrlein, G. Oehrlein, B. Kastenmeier, 1995 .

Axial temperatures and electron densities in a flowing cascaded arc: model versus experiment

D. Schram, De Graaf, J. Beulens, 1993 .

Optical diagnostics for high electron density plasmas

G. Dinescu, Van de Sanden, A. Buuron, 1993 .