M. Peikert

Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoring

M. Caymax, Y. Mols, E. Vancoille, 2014, 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014).

Improvement of Ta-based thin film barriers on copper by ion implantation of nitrogen and oxygen

C. Wenzel, J. Bartha, A. Mücklich, 2002 .

The effect of silicon ion implantation on the structure of tantalum–silicon contacts

C. Wenzel, A. Mücklich, H. Reuther, 2004 .

Incorporation of nitrogen in thin tantalum films using plasma immersion ion implantation

D. Gehre, H. Reuther, E. Wieser, 2005 .