V. Hody

In situ spectroscopic ellipsometric study of porous alumina film dissolution

N. Stein, J. Lecuire, M. Rommelfangen, 2002 .

Role of silicon on the growth mechanisms of CNx and SiCN thin films by N2/CH4 microwave plasma assisted chemical vapour deposition

M. Belmahi, J. Bougdira, H. Migeon, 2008 .

Modification of Hexatriacontane by O2–N2 Microwave Post-Discharges

F. Poncin‐Epaillard, T. Belmonte, G. Henrion, 2006 .

Oxygen plasma surface interaction in treatments of polyolefines

T. Belmonte, G. Henrion, T. Czerwiec, 2005 .

Preliminary Synthesis of Carbon Nitride Thin Films by N2/CH4 Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Films

B. Assouar, M. Belmahi, J. Bougdira, 2007, 2109.04777.